Helsingin yliopisto


Helsingin yliopiston verkkojulkaisut

University of Helsinki, Helsinki 2004

Atomic Layer Deposition of Oxide Films - Growth, Characterisation and Reaction Mechanism Studies

Raija Matero

Academic Dissertation, December 2004.
University of Helsinki, Faculty of Science, Department of Chemistry, Laboratory of Inorganic Chemistry.

  1. As a PDF file (ISBN 952-10-2239-6) - 305 kB

This publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited.

© University of Helsinki 2004

Last updated 03.12.2004/RM

Yhteystiedot, Contact information E-thesis Helsingin yliopisto, University of Helsinki