|
University of Helsinki, Helsinki 2002 Atomic Layer Deposition of High Permittivity Oxides: Film Growth and In Situ StudiesAntti RahtuAcademic Dissertation, September 2002.
This publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited. © University of Helsinki 2002 Viimeksi päivitetty 09.09.2002/AR |