This thesis consists of two separate tasks: the installation of a radio frequency (RF) source in the Facility for Nanocluster Deposition at the University of Helsinki and the deposition on palladium (Pd) and platinum (Pt) clusters on both silicon (Si) and gold (Au) surfaces. The samples were characterized with scanning electron microscopy (SEM), energy dispersive x-ray spectroscopy (EDS) as well as scanning tunnelling microscopy (STM).
A RF source was installed to enable the production of semiconductor clusters. The function of the new voltage source was tested, by preparing a sample that was characterized by using SEM and EDS. Consequently we could conclude that no clusters had been deposited and further testing of the apparatus is needed.
Pd- and Pt-clusters were deposited on Si- and Au-surfaces followed by characterization with SEM, EDS and STM. Di erent sputtering parameters were used to determine values needed for deposition of separate nanoclusters or monolayers of Pt and Pd.
SEM and EDS have been disclosed from future surface characterisations of samples containing both Au and Pt. This is due to the inability to separate the signals of Au from the ones emerged by Pt. The spatial- and depth resolutions are also better with the STM compared to the SEM. We have been able to predict the required deposition times for depositing palladium and platinum clusters for future experiments.
